WebJul 26, 2024 · In this paper, we successfully synthesized homoepitaxial diamond with high quality and atomically flat surface by microwave plasma chemical vapor deposition. The sample presents a growth rate of 3 μm/h, the lowest RMS of 0.573 nm, and the narrowest XRD FWHM of 31.32 arcsec. An effect analysis was also applied to discuss the influence … http://www.csmc-semi.com/a/9-222.html
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WebOct 3, 2024 · B doped p+ diamond films were fabricated by HFCVD using W filaments with the temperature maintained at approximately 2100 °C during growth. The distance between the filaments and substrates was fixed at 15 mm. The CH 4 and H 2 gas flows were 30 and 995 sccm, respectively. The total pressure was 30 Torr. WebFour different catalysts, nanodiamond seed, nano-Ni, diamond powder, and mixture of nano-Ni/diamond powder, were used to activate Si wafers for diamond film growth by hot-filament CVD (HFCVD). Diamond crystals were shown to grow directly on both large diamond powder and small nanodiamond seed, but a better crystallinity of diamond film … coach eason
基于沉积工艺的金刚石基 GaN 集成研究
WebMay 1, 2024 · Different diamond films were deposited on the WC-Co substrates by using a HFCVD reactor. The diamond films were N-doped by adopting the urea or nitrogen gas as the doping source, and the doping ratios (i.e., N/C atomic ratios in the gaseous reactant gas) were set to 500, 2000, 4000 and 8000 ppm, respectively. WebBDD电极的制备及其特性的研究摘 要本篇论文使用了热丝化学气相沉积法(HFCVD)制备掺硼金刚石(BDD)膜电极,接着对掺硼金刚石薄膜的生长特性进行深入的研究和仔细的分析。 ... 电极 的制备及其在超高浓度有机污染物废水处理中的研究 Electro-catalytic behavior of ... WebKeywords: mechanical seals; diamond; HFCVD; multi-layer; adhesion; WC-Co; superficial pre-treatments; wear tests 1. Introduction The mechanical seal is a device developed on the late 1930s and the beginning of the 1940s. It allows the connection between systems or mechanisms with the purpose of reducing or eliminating fluid leaking. caldicotes primary academy middlesbrough